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We honor the pioneering scientists and engineers who established microwave plasma chemical vapor deposition (MW CVD) diamond technology.
Foundational work at the National Institute for Research in Inorganic Materials (NIRIM) demonstrated diamond synthesis in microwave plasma environments (Kamo, Sato, Matsumoto, and Setaka, Journal of Crystal Growth, 1983), establishing the basis for modern plasma-assisted diamond growth systems.
We also recognize the original equipment developers at ASTeX whose engineering work translated laboratory plasma science into reliable industrial systems, including R. Post, D. Smith, and V. Berkman, whose contributions helped define the architecture of commercial microwave plasma CVD platforms.