Double seals and conflat flanges to significantly reduce N2 contamination.
Supercharged Deposition Tool with atmospheric plasma
PPM UHP - Ultra High Purity
PPB Nitrogen leak purity implemented with differentially pumped O rings and Conflat Flange on all seals (compare with O rings on prior systems)
Higher power option (10kW) for larger area/higher growth rate processes.
6-600 Torr pressure range for stable, high growth-rate,single crystal processes.
Two opposing substrates = 2x throughput
2x (Pyrometers and thermocouples) = accurate temperature
Advanced process control and monitoring including internet access to system control functions.
Flexible fixturing with enhanced throughput for seed substrate processes.
Modern software includes advanced (trailing) interlocks and web/mobile access to system data and control
Integrated ergonomic single cabinet design for easy operation and service access.
Bias Enhanced Nucleation (BEN) for heteroepitaxy.
Scientific Report - Nature.com
100mm (4") diameter wafer heater providing +-10% uniformity microcrystalline thin diamond films
Temperature controlled Translation Stage for large single crystal growth
Plasma views through angled 70mm CF windows
No line of sight between quartz microwave
window and plasma. This reduces silicon
contamination from the window - a common
contamination due to atomic hydrogen
reaction with quartz silicon dioxide.
Stable plasma for wide range off pressure, power and substrate geometry
Integrated Helium leak testing port
Power upgradeable (retrofitted to existing systems) up to 10KW
White Diamond Tube: 5mm ID, 2 cm long.
1.1 Ct Brilliant Cut Single Crystal
Polycrystalline and Single Crystal Detectors
World Class Electronic Performance
Easy Access clam shell chamber
Newly Designed 10KW plasma chamber with wide viewports.
650 torr plasma observable from multiple 70mm wide conflat windows - large enough to easily use cameras or measurement devises